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MANUFACTURING-semiconductor-panel-scale-integration
Tier 12026-02-10

The I/O Performance Wall — Semiconductor Packaging Cannot Scale to Meet AI Compute Demand

manufacturingdigitalenergy

Problem Statement

AI model growth is driving exponential demand for compute, but performance is no longer scaling because conventional semiconductor packaging creates memory bandwidth, I/O, and power delivery bottlenecks between chips. The industry needs to move from individual chip packages to wafer-scale (300mm) or panel-scale (500mm x 500mm) heterogeneous integration — stitching together compute, memory, photonics, power delivery, and cooling onto a single massive substrate — but the fundamental physics of thermal management, signal integrity, power delivery, and manufacturability at this scale are unsolved.

Why This Matters

Semiconductors underpin every critical technology sector: AI, communications, defense, healthcare, energy. Simply making faster transistors no longer translates to faster systems because the interconnects between chips are the bottleneck. Panel-scale integration could provide roughly 3x the integration area of wafer-scale approaches, but no one has demonstrated it. This is a binding constraint on AI hardware scaling and a direct U.S. national security and economic competitiveness concern, given concentrated global semiconductor supply chains.

What’s Been Tried

Traditional 2D packaging (chips side by side on a circuit board) is fundamentally limited by long interconnect distances and coarse pitch. 2.5D packaging using silicon interposers and 3D stacking (dies vertically) improve density but create thermal hotspots that degrade reliability. Commercial chiplet approaches from AMD and Intel are successful but limited to small substrates. At wafer or panel scale, warpage, thermal stress, and yield challenges multiply dramatically. Electromagnetic interference between tightly packed heterogeneous components (RF, digital, analog, photonic) is poorly understood. No one has demonstrated a viable power delivery plane or optical communication plane at panel scale. The co-design problem — jointly optimizing compute, memory, I/O, and thermal management as a unified system — lacks adequate tools and methodologies.

What Would Unlock Progress

New thermal management architectures for dense heterogeneous integration; co-design methodologies that optimize compute, memory, I/O, and power delivery as a unified system rather than separate components; novel substrate materials (e.g., glass panels) with better thermal and electrical properties than organic laminates; and integrated photonic interconnects that can replace electrical I/O at panel scale. Progress likely requires advances across materials science, electrical engineering, and mechanical engineering simultaneously.

Entry Points for Student Teams

A student team could design and simulate a thermal management solution for a multi-chiplet module, comparing substrate materials (silicon, organic, glass) under realistic power density profiles using finite element analysis. This is feasible with standard simulation tools (COMSOL, ANSYS) and provides publishable results. Alternatively, a team could prototype and characterize signal integrity through a heterogeneous interposer using PCB test structures that mimic panel-scale interconnect geometries at accessible dimensions.

Genome Tags

Constraint
technicalmanufacturingsupply-chain
Domain
manufacturingdigitalenergy
Scale
global
Failure
lab-to-field-gaptech-limitation-now-resolved
Breakthrough
materialshardware-integrationprocess
Stakeholders
multi-institution
Temporal
worsening
Tractability
proof-of-concept

Source Notes

- NSF ASCENT is a partnership with Intel specifically targeting heterogeneous integration challenges. - Intel has published on panel-scale integration as a research priority: https://www.intel.com/content/www/us/en/research/panel-scale.html - Cross-domain connection: the thermal management challenge shares structure with problems in concentrated solar power and high-power laser systems where thermal dissipation at density is also a binding constraint. - The chiplet standardization effort (UCIe — Universal Chiplet Interconnect Express) addresses interoperability but not the fundamental physics of scaling to larger substrates. - Related problem: electromagnetic compatibility at heterogeneous integration densities could be a separate brief.

Source

"ASCENT: Addressing Systems Challenges through Engineering Teams," NSF-Intel Partnership, Solicitation NSF 25-503. https://www.nsf.gov/funding/opportunities/ascent-addressing-systems-challenges-through-engineering-teams/505853/nsf25-503/solicitation (accessed 2026-02-10).